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Open Graph Drawing Framework
clustered graph  crossing minimization crossing number ogdf simultaneous drawing spqr-tree
www.ogdf.net - 2009-02-14
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We specialize in developing top quality resists, thick resists, photoresists, spin-on glass, planarazinig, coatings, resists, positive, resists, negative, ...
lift-off photoresist lift-off process lift-off resist liftoff resist lift-offs negative photoresist negative photoresists negative resist negative resists planarizing coating positive photoresist positive photoresists positive resist positive resists spin-on dopant thick photoresists thick resist thick resists
www.futurrex.com - 2009-02-12
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Honeywell Electronic Material Home
advanced integrated circuits Honeywell Electronic Materials low-k dielectrics mixed acid etchants PVD targets solents subtractive aluminum
www.electronicmaterials.com - 2009-02-14
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Semi MFG Equipment for FC Die Bonding, Chemical Mechanical Planarization, Electrodeposition of Photoresist & Electroless UBM. R&D Fab for MEMS, 3-D Advanced ...
3-D Development Advanced Process Systems ED Photoresist Coater Electroless UBM R&D Contract Fab www.apsinc-us.com
www.apsinc-us.com - 2009-02-05
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about products representation & development contact home about products representation & development contact Copyright 2005, Claughton Miller & Associates
Claughton Miller Claughton Miller & Associates CMP Pad CMP Polish Pad CMP sales Disk Burnish Disk Burnishing Disk Polishing Disk Texture slurry Disk Texturing Hard Disk Drive Texture Hard Disk Texture HDD Polish Pad HDD sales Texture Tape
www.claughtonmiller.com - 2009-02-12
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OKAMOTO CORPORATION, Semiconductor Equipment Division is providing Sales & Service for Wafer Back Grinder for Si-Ge-Altic-GaAs-SOI-Silica, Polisher, Pitch ...
backgrinder dicing machine infeed grinder Pitch Polisher SOI Grinder
www.okamoto-sed.com - 2009-02-04
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Home Thermal Analysis Conditioning Consulting About Us Intelligent Planar Intelligent Planar CMP Process Improvement and Consumables Reduction CMP Process ...
Boruki Burocki CMP consumables reduction CMP process optimization Cu planarization dielectric planarization intelligentplanar Len Borucki lo-K dielectrics modeling CMP physics of CMP
www.intelligentplanar.com - 2009-02-06
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The First International Conference on Abrasive Processes will be held in Cambridge, UK, in 2008. The confernce theme is the degradation of engineering surfaces ...
abrasion and erosion damage abrasive processing abrasive water-jet cutting cavitating liquids erosive processing liquid impact micro-abrasive jet blasting scratch deformation
www.icapw.com - 2009-02-09
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XYALIS is the leading EDA software provider in design for manufacturing. We help design engineers increase yield, reduce time to market and manage large GDSII ...
www.xyalis.com - 2009-02-07
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Techcet Group is a market research firm specialized in semiconductor and other electronics materials. The company is well known for their Critical Materials ...
ALD Precursors post CMP cleaning Rose Associates Wet Chemicals
www.techcet.com - 2009-02-05
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