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MultiCPM - Simultaneous Real Time Multi-Chamber - Multi diagnosis monitor
The MULTISEM design concept is based on an open parallel architecture consisting of a central supervisor control unit, and a network of analytical substations
plasma
etch
OES
Sofie
endpoint
interferometry
Horiba
interferometers
plasma etch
Jobin Yvon
end point
dry etching
optical emission
optical emission spectroscopy
dry etch
thin film characterisation
end point detection
plasma monitoring
endpoint detection
plasma characterization
thin film measurements
deposition rate
end point detectors
endpointer
end pointer
end point systems
endpoint systems
etch rate
thin film monitors
Digitwin
plasma characterisation
www.multisem.com - 2009-02-13
DIGILEM - Interferometric Endpoint Detector & Thin Film Monitor
Interferometry is a powerful technique that can be used for endpoint detection of planar layer and trench etching, or deposition
plasma
semiconductor
semiconductors
deposition
etch
interference
Sofie
endpoint
interferometry
film thickness
interferometers
plasma etch
end point
dry etching
thickness monitors
dry etch
thin film characterisation
end point detection
endpoint detection
thin film measurements
deposition rate
end point detectors
endpointer
end pointer
end point systems
endpoint systems
etch rate
thin film monitors
Digilem
etching control
semiconductor characterisation
www.digilem.com - 2009-02-08
engrave
etch
etch rate
interferometers
etching
optics
metrology
interferometer
glass
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